Reference number
ISO 21859:2019
© ISO 2024
International Standard
ISO 21859:2019
Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
Edition 1
2019-06
Read sample
Published (Edition 1, 2019)

ISO 21859:2019

Language
Format
CHF 42
Convert Swiss francs (CHF) to your currency

Abstract

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

General information

  • Status
     : Published
    Publication date
     : 2019-06
    Stage
    : Close of review [90.60]
  • Edition
     : 1
    Number of pages
     : 4
  • Technical Committee :
    ISO/TC 206
    ICS :
    81.060.30 
  • RSS updates

Life cycle

Sustainable Development Goals

This standard contributes to the following Sustainable Development Goal

9
Industry, Innovation and Infrastructure

Got a question?

Check out our Help and Support

Check out our FAQs

Customer care
+41 22 749 08 88

Opening hours:
Monday to Friday - 09:00-12:00, 14:00-17:00 (UTC+1)

  2. Store
  3. Standards catalogue
  4. TC
  5. ISO/TC 206
  6. ISO 21859:2019