Reference number
ISO 21859:2019
© ISO 2024
International Standard
ISO 21859:2019
Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
Edition 1
2019-06
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Published (Edition 1, 2019)
This publication was last reviewed and confirmed in 2024. Therefore this version remains current.

ISO 21859:2019

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Format
CHF 42
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Abstract

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

General information

  • Status
     : Published
    Publication date
     : 2019-06
    Stage
    : International Standard confirmed [90.93]
  • Edition
     : 1
    Number of pages
     : 4
  • Technical Committee :
    ISO/TC 206
    ICS :
    81.060.30 
  • RSS updates

Life cycle

Sustainable Development Goals

This standard contributes to the following Sustainable Development Goal

9
Industry, Innovation and Infrastructure

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